Until EUV lithography becomes a reality, multiple patterning technologies such as triple litho-etch (LELELE), self-aligned double patterning (SADP), and self-aligned quadruple patterning (SAQP) are ...

Using electron beams to create the mask patterns directly on a chip. The wavelength of an electron beam is only a few picometers compared to the 248 to 365 nanometer wavelengths of light used to ...

Four of the largest semiconductor companies are planning to move to ASML's EUV lithography technology in the next two years. Customers of EUV will be able to manufacture chips with a significantly ...

Computational lithography uses various techniques of resolution enhancement technology (RET) to create more perfect images on the chip as the elements of the transistor get smaller and smaller. THIS ...